thin film deposition

Thin film deposition by ICP-enhanced nonequilibrium magnetron sputtering process For ICP AES analysis.

射频等离子体增强非平衡磁控溅射沉积技术分析过程冗长，不利于生产质控。

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Computer Simulation of Thin Film Deposition by RF Magnetron Sputtering

射频磁控溅射沉积薄膜的计算机模拟

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The planar magnetron sputtering target for α-si: h thin film deposition

淀积α-Si：H薄膜的磁控靶

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Manufacture for light splitting grating in optical disk based on precision ruling and thin film deposition

基于精密刻划及薄膜沉积技术的光盘分束光栅研制

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Li4/ 3Ti5/ 3O4 thin film was prepared by solution deposition using lithium acetate and TiO ( C4H9) 4 as starting materials.

以醋酸锂和钛酸四丁酯为原料，采用溶液沉积法制备Li4/3Ti5/3O4薄膜。

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Third, the quality of thin film deposition and the length of time is not much impact, but will affect the surface morphology.

沉积时间长短对薄膜质量并没有太大影响，但会影响表面形貌。

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Computer simulation of optical thin film deposition

光学薄膜淀积的计算机仿真

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Fresnel lens fabricated by thin film deposition

薄膜沉积法制作菲涅耳透镜

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A market forecast for Thin Film Deposition Tools is presented to 2006.

报告提供了2006年薄膜沉积市场预测信息.

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Finite element method simulation of affecting factors during metal thin film deposition

影响金属薄膜沉积初期因素的有限单元法模拟

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The thin film deposition can control precisely the height of the step and can obtain smooth surface.

薄膜沉积法具有精确控制台阶高度及台阶表面较光滑的优点。

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Effect of plasma parameters on thin film deposition during multi-arc ion coating

多弧离子镀沉积过程中等离子体参数对薄膜沉积的影响

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Application and Development of Computer Simulation in Thin Film Deposition

薄膜沉积机理的计算机模拟应用和发展

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The Bi_2Te_3 thin film deposition on Au substrate using electrochemical atomic layer epitaxy

Bi2Te3热电薄膜的电化学原子层外延制备

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A manufacturing method for a light splitting grating based on precision ruling and thin film deposition technologies was presented.

给出了采用光栅刻划和镀膜技术相结合研制光盘分束光栅的方法。

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When the power is too high, ion bombardment effect results in the decrease of thin film deposition rate.

当功率过高时，离子的轰击作用导致薄膜的沉积速率降低。

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This thesis studies the organic thin film deposition method, in order to prepare thin films of a higher order organic thin film transistor.

本论文主要研究有机薄膜的蒸镀方法，以此来制备薄膜有序性较高的有机薄膜晶体管。

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Research on thin film deposition rate deposited by sputtering

溅射镀成膜速率的研究

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Plasma enhanced chemical vapor deposition ( PECVD) is one of the matured and simple manipulated among the thin film deposition methods at low temperature.

等离子增强化学气相沉积（PECVD）是低温沉积硅膜的主要方法。

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DOE's fabrication techniques mainly include laser beam or electron beam writing, RIE, ion milling and thin film deposition.

衍射光学元件的制作技术主要包括激光或电子束直写、反应离子刻蚀、离子束铣及薄膜沉积。

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Filtered Cathodic Arc Plasma Source and Thin Film Deposition

磁过滤的阴极弧等离子体源及其薄膜制备

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A study of superconducting lead thin film deposition by high power co_2 CW laser

大功率CO2连续激光镀制超导铅膜研究

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The optical energy gap of CdTe thin film is mainly due to it deposition process, and varies little after annealing at various ambience.

CdTe薄膜光能隙主要由制备工艺决定，经过不同气氛下后处理后，变化不大。

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Finally, we verified the practicability of floating harmonic probe in the process of thin film deposition.

最后，对悬浮谐波探针的实用性进行了研究。

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The fabrications are mainly based on semiconductor cleanroom facilities, which include thin film deposition, electron beam lithography, and etching.

这些工艺主要是基于超净室的一些设备，其中主要包括：薄膜沉积、电子束光刻、以及刻蚀。

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The iH pump is specially designed to cope with the harsh environment of thin film deposition process.

iH真空泵是特别为应付恶劣的薄膜工艺环境所设计。

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Parallel computation for the thin film deposition on the now

基于机群系统的薄膜淀积并行计算

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Hot Cathode Saddle Field Ion Source and its Application in Optical Thin Film Deposition

热阴极鞍场离子源及其在光学薄膜技术中的应用

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With these advantages, Microwave ECR plasma finds number of applications in the areas of etching technologies, thin film deposition and plasma source.

建立了ECR微波等离子体源离子输运的平板和圆柱模型，对离子历经的空间区域的输运过程进行了数值研究。

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Low Stress Silicon Nitride Thin Film Deposition by PECVD

低应力PECVD氮化硅薄膜的制备

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